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气熔透明雷速体育平台材料
FLH211 FLH311 FLH321 FLH321N FLH321H FLH321HS

材料简介

Introduction

气熔 首图 拷贝.jpg

气熔雷速体育平台材料


气泡少,具有良好的透明度和几何尺寸。广泛应用于半导体、光纤、太阳能光伏、光学镀膜等领域。


The material has few bubble in it with excellent transparency and geometric dimension .They are widely used for semiconductor,Optical Fiber, Solar Energy Photovoltaics, Optical Coating/Filming.

气熔雷速体育平台材料.jpg

气熔高纯少气泡雷速体育平台材料


气熔高纯少气泡雷速体育平台材料,具有气泡少、纯度高,几乎无包裹物、耐高温性能等特性,广泛的应用于半导体先进制程、光学、化学加工、紫外线和高温窗口等。


Thanks to the few bubbles, high purity, almost no inclusion, high temperature resistant performance and other characteristics,FLH321HS has been widely used in semiconductor advanced manufacturing, optical, chemical processing, UV and high temperature window.

  杂质含量

  Chemical purity


FLH211/FLH311/FLH310 杂质元素典型值            (ppm)

Al

22.00

B

0.20

Ca

1.50

Co

<0.05

Cu

<0.05

Fe

1.50

K

2.00

Li

2.00

Mg

0.30

Mn

<0.10

Na

2.00

Ni

<0.10

Ti

2.00

OH

~200



FLH321/FLH320 杂质元素典型值            (ppm)


Al

14.20

B

0.08

Ca

0.50

Co

0.50

Cu

<0.01

Fe

0.23

K

0.30

Li

0.50

Mg

<0.05

Mn

<0.05

Na

0.30

Ni

<0.05

Ti

1.30

OH

~200



FLH321H/FLH320H 杂质元素典型值            (ppm)


Al

8.00

B

0.04

Ca

0.60

Co

0.05

Cu

<0.01

Fe

0.10

K

0.20

Li

0.40

Mg

<0.05

Mn

<0.05

Na

0.12

Ni

<0.05

Ti

1.40

OH

~200



FLH321N/FLH320N 杂质元素典型值            (ppm)


Al

12.00

B

0.08

Ca

0.30

Co

<0.02

Cu

<0.01

Fe

0.10

K

0.20

Li

0.40

Mg

<0.05

Mn

<0.05

Na

0.40

Ni

<0.03

Ti

1.20

OH

~200



FLH321HS 杂质元素典型值            (ppm)


Al

7.50

B

Ca

0.60

Co

Cu

<0.01

Fe

0.20

K

0.10

Li

0.20

Mg

0.01

Mn

Na

0.10

Ni

Ti

1.30

OH

~200

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